Various Vacuum Deposition Equipment
We will customize a wide variety of vacuum devices to meet user needs.
Introducing the various vacuum deposition devices handled by Nanotech, which values creativity and continues research and development that is not swayed by trends. Our company customizes a wide variety of vacuum devices to meet user needs. We offer the "ICF deposition device" for film deposition using the HIPIMS method, as well as the plasma etching device "NAPE500" for semiconductor plasma cleaning. 【Product Lineup】 ■ ICF deposition device ■ Plasma etching device "NAPE500" ■ Pulse bias experimental device "ICF330" *For more details, please refer to the PDF materials or feel free to contact us.
- Company：ナノテック
- Price：Other
